High-Contrast Chemically Amplified Photodefinable Poly(benzoxazole) Using Dissolution Reversers

Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography

Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography The aqueous base development step is one of the most critical processes in modern lithographic imaging technology. Sinusoidal modulation of the exposing light intensity must be converted to a step function in the resist film during the development process. Thus, in designing high-performance resi...

Calibration of Chemically Amplified Resist Models

Photodefinable electro-optic polymer for high-speed modulators

Direct waveguide definition of a negative photoresist (SU8) containing tricyanovinylidenediphenylaminobenzene (TCVDPA) as electro-optic (EO) chromophore, has been demonstrated for the first time. This was possible by utilising the chromophore low absorption window in the UV region allowing crosslinking of the host polymer by exposing to UV light followed by thermal curing. TCVDPA was modified b...

Direct measurement of the reaction front in chemically amplified photoresists.

The continuing drive by the semiconductor industry to fabricate smaller structures using photolithography will soon require dimensional control at length scales comparable to the size of the polymeric molecules in the materials used to pattern them. The current technology, chemically amplified photoresists, uses a complex reaction-diffusion process to delineate patterned areas with high spatial...

Characterization of a Chemically Amplified Photoresist for Simulation using a Modified “Poor Man’s DRM” Methodology

As we enter the DUV lithography generation, the developmental phase of the photolithography process is becoming crucial due to the high costs associated with the lithography equipment. Improvements in the modeling of chemically amplified resists are necessary to extract the maximum possible information from the minimum amount of experimentation. The poor man’s dissolution rate monitor (drm) met...